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Microfabrication methods and nanofabrication techniques. Imaging and characterization of micro and nanostructures. Restricted to students admitted to the Nanotechnology and Microsystems Option in Electrical Engineering. [2-4-0]
This is a hands-on opportunity to develop skills in design, fabrication and experimentation relating to CMOS manufacturing in the context of silicon photonics applications. In this course, students will design an optical circuit using commercial EDA tools (Electronic Design Automation) and optical modelling TCAD Software (Technology Computer Aided Design), have it fabricated via electron beam lithography, and conduct post-processing (thin film deposition, optical lithography, metal deposition) and characterization (AFM, SEM, optical, electronic) in the AMPEL Nanofabrication Facility and optoelectronics labs.
students with an interest in CMOS, electronics, and/or optical design; EECE Nano option students.
Introduction to micro/nano devices, fabrication and characterization
No formal pre-requisites; basic math, programming and computer skills assumed