Micro/Nanofabrication and Instrumentation Laboratory

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3 Credits

ELEC 463

Microfabrication methods and nanofabrication techniques. Imaging and characterization of micro and nanostructures. Restricted to students admitted to the Nanotechnology and Microsystems Option in Electrical Engineering. [2-4-0]

Course Outline
This is a hands-on opportunity to develop skills in design, fabrication and experimentation relating to CMOS manufacturing in the context of silicon photonics applications.  In this course, students will design an optical circuit using commercial EDA tools (Electronic Design Automation) and optical modelling TCAD Software (Technology Computer Aided Design), have it fabricated via electron beam lithography, and conduct post-processing (thin film deposition, optical lithography, metal deposition) and characterization (AFM, SEM, optical, electronic) in the AMPEL Nanofabrication Facility and optoelectronics labs.

Target Audience
students with an interest in CMOS, electronics, and/or optical design; EECE Nano option students.

Course Topics

Introduction to micro/nano devices, fabrication and characterization

  • Lithography
  • Thin film deposition
  • Etching
  • CMOS manufacturing
  • Silicon photonics
  • Electron microscopy
  • Scanning probe microscopy

Pre-requisites
No formal pre-requisites; basic math, programming and computer skills assumed

 

 

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