Micro/Nanofabrication and Instrumentation Laboratory
Microfabrication methods and nanofabrication techniques. Imaging and characterization of micro and nanostructures. Restricted to students admitted to the Nanotechnology and Microsystems Option in Electrical Engineering. [2-4-0]
Course Objective
- Fabricate and measure a silicon photonic circuit, using methods similar to what is used for CMOS electronics
- design an optical circuit using an open-source layout tool, optical modelling TCAD software (Technology Computer Aided Design), and Matlab
- fabricate it using a state-of-the-art electron beam lithographyconduct post-processing (thin film deposition, optical lithography, metal deposition)
- perform characterization (AFM, SEM, optical, electronic)
3 credits
Course Outline
This is a hands-on opportunity to develop skills in design, fabrication and experimentation relating to CMOS manufacturing in the context of silicon photonics applications. In this course, students will design an optical circuit using commercial EDA tools (Electronic Design Automation) and optical modelling TCAD Software (Technology Computer Aided Design), have it fabricated via electron beam lithography, and conduct post-processing (thin film deposition, optical lithography, metal deposition) and characterization (AFM, SEM, optical, electronic) in the AMPEL Nanofabrication Facility and optoelectronics labs.
Target Audience
students with an interest in CMOS, electronics, and/or optical design; EECE Nano option students.
Course Topics
Introduction to micro/nano devices, fabrication and characterization
- Lithography
- Thin film deposition
- Etching
- CMOS manufacturing
- Silicon photonics
- Electron microscopy
- Scanning probe microscopy
Pre-requisites
Recommended: ELEC 315. No formal pre-requisites; basic math, programming and computer skills assumed.
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