Micro/Nanofabrication and Instrumentation Laboratory
Methods and techniques used for device fabrication in the micro and nano domains. Imaging and characterization of micro/nanoscale structures. Their physics and applications to integrated circuits (IC) and micro-electro-mechanical systems (MEMS). Restricted to the 4th-year students in Electrical Engineering. [2-3-0]
3 credits
Course Objective
- Understand principles and features of key micro/nanofabrication methods used for silicon chip production and other applications
- Design and fabricate a miniaturized functional device through the methodology similar to what is used for IC manufacturing
- Prototype the device using standard micro/nanofabrication processes and state-of-the-art tools
- Perform characterization (electronic, mechanical, etc.) of produced structures and designed functions
Course Outline
- Materials and methodologies for IC and MEMS fabrication
- Lithography (optical and others)
- Thin-film deposition and etching
- Doping
- Surface and bulk/3D micromachining
- Microscopy and nanoscale measurements
Pre-requisites
Recommended: ELEC 315. No formal pre-requisites; basic physics/math and computer skills assumed.